Electromigration-Aware Architecture for Modern Microprocessors

Reliability is a fundamental requirement in microprocessors that guarantees correct execution over their lifetimes. The reliability-related design rules depend on the process technology and device operating conditions. To meet reliability requirements, advanced nodes impose challenging rules, which place major burden VLSI implementation flow because they severe physical constraints. This paper focuses electromigration (EM), one of critical factors affecting semiconductor reliability. EM aging on-die wires integrated circuits (ICs). Traditionally, issues have been handled at level, enforces using worst-case scenario analysis to detect solve violations. In this paper, we offer solutions exploit architectural characteristics reduce impact. use methods can simplify solutions, such be incorporated with standard physical-design-based enhance current methods. Our comprehensive simulation results show that, minimal area, power, performance overhead, proposed solution relax efforts significantly extend microprocessor’s lifetime.